ICP etching equipment - Sumitomo Precision Products MUC-21-036
Product Specifications
Maker Sumitomo Precision Products
Model MUC-21-036
Model year 2004
External Dimensions
Showroom Information
Exhibition hall Enzan Technical Center
Price & Inquiry
price Price Inquiry
Inquiry Number Q20313
Mechanical Specifications
The process chamber is configured for Si trench etching
Plasma is 13.56MHz
Dry pump (Edwards IQDP80),
Dry pump (Edwards IH80-MK5)
Chiller (RISSHI μEX-1102), Chiller (NESLAB M75)
Scroll pump (BUSCH F0 0030 B 0H0..XX)
Instruction manual and other accessories included
Attachments
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