Winding sputtering equipment
Maker Lock Technology
Model RVS-W-510-A
Model year 2011
External Dimensions W4750 D5900 H2700
Exhibition hall Kyushu Technical Center
price Price on request
Inquiry Number N80462
Mechanical Specifications
Winding section: width 510mm, thickness: 50μm to 175μm
3 magnetron cathodes (128mm x 725mm square)
Sputtering power supply: 20Kw x 2, 10Kw x 1
Film formation speed: 200nm・m/min
Heating temperature: 200℃ Magnet: 400G
High frequency power supply: 0.75Kw
Target divider box: 550mm x 180mm
Pretreatment chamber: 550mm x 72mm Target substrate: 100mm
Vacuum chamber inner dimensions: W1050xD1250xH1700
Usable cores/taper caps: 3 inch, 6 inch
3φ200V 50Hz 130Kw
Gas used: Ar N2
Attachments
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