Sputtering Equipment
Maker Canon Anelva
Model E-402S
Model year 2008
External Dimensions 2150x2250x2200
Exhibition hall Kyushu Technical Center
price Price on request
Inquiry Number L70777
Mechanical Specifications
Workpiece: Φ8in, Φ6in wafer
Equipment configuration: LL room → Traverser room → SP1 room on the left and right, SP2 room
Sputtering chamber: W580xL980xH305mm (external dimensions)
Sputter-up method
Cathode φ317mm RMC for non-magnetic materials, 1 unit in each SP room
Target dimensions: approx. φ310x5t
Holder Shape
φ370mm heating holder with heat conduction gas mechanism, reverse sputtering possible
Up and down stroke: approx. 200mm
Distance between electrodes: approx. 50mm to 250mm
Sputtering power supply
DC power supply 3.0Kw RF power supply 5.0Kw 600W
3φ200V 50/60Hz 150A
Attachments
※ Click on the image below to zoom in.
